Overfill Defect: High copper concentration -> Dummy plating / Partial descaling. Low sulfuric acid concentration -> Add purified sulfuric acid. High current density -> Reduce current density. Low Brightener concentration -> Increase Brightener concentration. Weak agitation -> Review spray pump settings / Nozzle cleaning, filter replacement. Weak or blocked nozzle and filter inlet weaken agitatio..

Void Defect: Weak agitation -> Review spray pump settings / Nozzle cleaning / Filter replacement. Weak agitation accelerates detachment near the hole's opening, making voids more likely to form. If the nozzle and filter inlet are blocked, agitation weakens, leading to void formation. High current density -> Reduce current density. High current density accelerates detachment near the hole's openi..

Continuing from the previous session, let's delve into troubleshooting electroless defects and their causes. Dimple Defect: Low copper concentration -> Add cuprous oxide or high-purity cupric sulfate. High sulfuric acid concentration -> Partial descaling. When the copper concentration is low or sulfuric acid concentration is high, deposition occurs in a hole-like manner due to increased polariza..

Principle of Chemical Plating (However, the specific chemicals used, designs, and principles can vary depending on the chemicals used.) Utilizing the tendency of metals to ionize, Cu ions are reduced and deposited onto the product using Pd as a catalyst. Formaldehyde (HCHO) is oxidized to emit electrons on the Pd surface, supplying Cu+ ions to facilitate the deposition of Cu on the Pd surface. P..

지난 시간에는 금속 배선 공정 BEOL 공정의 접합 스파이킹(Junction spiking)에 대하여 알아보았습니다. 이번 시간에는 EM(Electro-migration)에 대하여 알아보겠습니다. 2. Electro-migration (EM) 알루미늄 배선은 소자의 도선 역할을 하면서 신호의 이동에 따라 전류가 흐르게 되는데, 스케일이 계속 줄어들면서 배선의 너비와 폭도 줄어들게 되었습니다. 그러면서 단위 면적당 흐르는 전류의 밀도가 높아지게 되는데, 전자의 흐름에 따른 원자와의 충돌에 의해 원자의 이동이 발생합니다. 원자의 이동은 주로 결정립계(grain boundary)를 통해 일어나게 되고, 원자가 이동하기 전 원래 있던 공간에 Void가 생기게 되고 반면에 이동한 원자가 쌓이게 되는 영역에는 힐록..