Plating process (13)

2023. 12. 14. 00:16Substrates

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Continuing from the previous session, let's delve into troubleshooting electroless defects and their causes.

 

Dimple Defect:

 

Low copper concentration -> Add cuprous oxide or high-purity cupric sulfate.

 

High sulfuric acid concentration -> Partial descaling.

 

When the copper concentration is low or sulfuric acid concentration is high, deposition occurs in a hole-like manner due to increased polarization resistance.

Low additive concentration -> Increase additive concentration.

 

High additive concentration -> Dummy plating / Activated carbon filter treatment.

 

When the additive concentration goes beyond the control range, the balance of additive action is disrupted.

Inadequate agitation -> Review spray pump settings / Nozzle cleaning / Filter replacement.

 

Excessive agitation leads to thin diffusion layers in the holes, resulting in dimple-like formations.

Impurities -> Dummy plating / Activated carbon filter treatment.

 

Impurities hinder the action of additives.

Extended idle time (+ high temperature during idle period) -> Dummy plating with chillers during idle state.

 

Prolonged high-temperature idle conditions can lead to degradation of additives.

 

 
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