Let's take a look at the defects in electroless plating. First, let's review the mechanism of electroless plating. Initially, due to the diffusion theory, deposition on the surface is inhibited, and the center of the through-hole (TH) connects. Next, according to the memory effect, deposition in the center of the TH is promoted, resulting in a smoother surface. Diffusion Theory: Due to strong ex..

I will learn about the mechanism and additives of electroless copper plating. Electroless Copper Plating Mechanism: Applying a cathode to the product intended for plating, causing the deposition of Cu. Soluble anode vs Insoluble anode 비교 Soluble anode - reaction : Cu -> Cu2+ + 2e- - by product : need to management with lever less donate system - cost : cheap - current distribution : poor - anode..